Han-ku Lee: шукати на сайті Z-Library

Найбільша колекція наукових статей у сіті. 70,000,000+ безкоштовних статей.

Пожертвування 15 вересня 2024 – 1 жовтня 2024

Z-Library - одна з найбільших онлайн-бібліотек у світі, в якій зберігається більше 17,000,000 книг та 84,837,000 статей. Ми намагаємось зробити літературу доступною кожному. Сьогодні (15 вересня 2024) ми відкриваємо додатковий збір пожертвувань на підтримку та розвиток проекту.

Також БЕЗЛІМТНІ завантаження (протягом 31 дня після завершення пожертвування) доступні для ВСІХ користувачів, які підтримають проект в період збору коштів до 1 жовтня 2024.

Про збір коштів Детальніше

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Статті (65)
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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVII - Yokohama, Japan (Tuesday 13 April 2010)] Photomask and Next-Generation Lithography Mask Technology XVII - The optical CD metrology for EUV mask

Park, Jin-Back, Hosono, Kunihiro, Bang, Kyoung-Yoon, Lee, Dong-Gun, Jeong, Hae-Young, Kim, Seung-Soo, Cho, Han-Ku

Рік:

2010

Мова:

english

Файл:

PDF, 1.10 MB

english, 2010

Collective communication for the HPJava programming language

Sang Boem Lim, Bryan Carpenter, Geoffrey Fox, Han-ku Lee

Журнал:

Concurrency and Computation: Practice and Experience

Рік:

2005

Мова:

english

Файл:

PDF, 262 KB

english, 2005

[IEEE 2009 Fourth International Conference on Computer Sciences and Convergence Information Technology - Seoul, Korea (2009.11.24-2009.11.26)] 2009 Fourth International Conference on Computer Sciences and Convergence Information Technology - PageRank vs. Katz Status Index, a Theoretical Approach

Phuoc, Nguyen Quang, Kim, Sung-Ryul, Lee, Han-Ku, Kim, HyungSeok

Рік:

2009

Мова:

english

Файл:

PDF, 263 KB

english, 2009

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100-nm device performance

Lee, Ji-Young, Shin, Jangho, Kim, Hyun-Woo, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung, Moon, Joo-Tae, Sturtevant, John L.

Рік:

2004

Мова:

english

Файл:

PDF, 174 KB

english, 2004

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Printability and inspectability of programmed pit defects on the masks in EUV lithography

La Fontaine, Bruno M., Kang, In-Yong, Seo, Hwan-Seok, Ahn, Byung-Sup, Lee, Dong-Gun, Kim, Dongwan, Huh, Sungmin, Koh, Cha-Won, Cha, Brian, Kim, Seoung-Sue, Cho, Han-Ku, Mochi, Iacopo, Goldberg, Kennet

Рік:

2010

Мова:

english

Файл:

PDF, 2.26 MB

english, 2010

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Realization of sub-80-nm small-space patterning in ArF photolithography

Kim, Si-Hyun, Sturtevant, John L., Kim, Hyung-Do, Lee, Si-Hyeung, Park, Chang-Min, Ryoo, Man-Hyoung, Yeo, Gi-Sung, Lee, Jung-Hyeon, Cho, Han-Ku, Han, Woo-Sung, Moon, Joo-Tae

Рік:

2004

Мова:

english

Файл:

PDF, 595 KB

english, 2004

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Evaluation of puddle time effect and optimization of development process in 193-nm lithography

Lee, Hyung-Rae, Sturtevant, John L., Shin, Jangho, Kim, Hyun-Woo, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung

Рік:

2004

Мова:

english

Файл:

PDF, 830 KB

english, 2004

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Comprehensive analysis of sources of total CD variation in ArF resist perspective

Kim, Hyun-Woo, Sturtevant, John L., Lee, Hyung-Rae, Kim, Kyung-Mee, Lee, Shi Yong, Kim, Bong-Cheol, Oh, Seok-Hwan, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung

Рік:

2004

Мова:

english

Файл:

PDF, 2.32 MB

english, 2004

Pattern Collapse Improvement in ArF Resist: Effect of Surfactant-added Rinse and Soft Bake

Jung, Myoung-Ho, Kim, Hyun-Woo, Lee, Sung-Ho, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung

Журнал:

Journal of Photopolymer Science and Technology

Рік:

2003

Файл:

PDF, 627 KB

2003

Experimental investigation of the impact of LWR on sub-100-nm device performance

Hyun-Woo Kim, Ji-Young Lee, Shin, J., Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Журнал:

IEEE Transactions on Electron Devices

Рік:

2004

Мова:

english

Файл:

PDF, 714 KB

english, 2004

SPIE Proceedings [SPIE 22nd European Mask and Lithography Conference - Dresden, Germany (Monday 23 January 2006)] 22nd European Mask and Lithography Conference - Analysis method to determine and characterize the mask mean-to-target and uniformity specification

Lee, Sung-Woo, Leunissen, Leonardus H. A., Van de Kerkhove, Jeroen, Philipsen, Vicky, Jonckheere, Rik, Lee, Suk-Joo, Woo, Sang-Gyun, Cho, Han-Ku, Moon, Joo-Tae, Behringer, Uwe F. W.

Рік:

2006

Мова:

english

Файл:

PDF, 417 KB

english, 2006

New types of dose distributions for vertical sidewall minimizing total dose in 3-D electron-beam proximity effect correction of nanoscale features

Dai, Qing, Lee, Soo-Young, Lee, Sang-Hee, Kim, Byung-Gook, Cho, Han-Ku

Журнал:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Рік:

2012

Мова:

english

Файл:

PDF, 2.06 MB

english, 2012

Fast simulation of stochastic exposure distribution in electron-beam lithography

Zhao, Xinyu, Lee, Soo-Young, Lee, Sang-Hee, Kim, Byung-Gook, Cho, Han-Ku

Журнал:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Рік:

2012

Мова:

english

Файл:

PDF, 1.29 MB

english, 2012

The 58-kDa microspherule protein (MSP58) represses human telomerase reverse transcriptase (hTERT) gene expression and cell proliferation by interacting with telomerase transcriptional element-interacting factor (TEIF)

Hsu, Che-Chia, Chen, Chang-Han, Hsu, Tsung-I, Hung, Jan-Jong, Ko, Jiunn-Liang, Zhang, Bo, Lee, Yi-Chao, Chen, Han-Ku, Chang, Wen-Chang, Lin, Ding-Yen

Журнал:

Biochimica et Biophysica Acta (BBA) - Molecular Cell Research

Рік:

2014

Мова:

english

Файл:

PDF, 1.51 MB

english, 2014

HP Java: Programming Support for High-Performance Grid-Enabled Applications

Lee, Han-Ku, Carpenter, Bryan, Fox, Geoffrey, Lim, Sang Boem

Журнал:

Parallel Algorithms and Applications

Рік:

2004

Мова:

english

Файл:

PDF, 298 KB

english, 2004

[Japan Soc. of Appl. Phys Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (29-31 Oct. 2003)] Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference - Quantitative evaluation of grid size effect on CD uniformity improvement

Doo-Youl Lee,, Sung-Woo Lee,, Gi-Sung Yeo,, Jung-Hyeon Lee,, Han-Ku Cho,, Woo-Sung Han,

Рік:

2003

Мова:

english

Файл:

PDF, 102 KB

english, 2003

Analytic modeling for the limit of mask mean-to-target from the photolithographic standpoint

Lee, Sung-Woo, Lee, Doo-Youl, Cho, Han-Ku, Han, Woo-Sung

Журнал:

Applied Physics Letters

Рік:

2004

Мова:

english

Файл:

PDF, 448 KB

english, 2004

[Japan Soc. Appl. Phys Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (6-8 Nov. 2002)] 2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. - Anti-shrinkage coating approach as a solution provider to ArF resists

Si-Hyeung Lee,, Hyung-Do Kim,, Sang-Jun Choi,, Jung-Hyeon Lee,, Han-Ku Cho,, Woo-Sung Han,, Joo-Tae Moon,

Рік:

2002

Мова:

english

Файл:

PDF, 71 KB

english, 2002

58-kDa Microspherule Protein (MSP58) Is Novel Brahma-related Gene 1 (BRG1)-associated Protein That Modulates p53/p21 Senescence Pathway

Hsu, Che-Chia, Lee, Yi-Chao, Yeh, Shiu-Hwa, Chen, Chang-Han, Wu, Chih-Ching, Wang, Tsui-Ying, Chen, Yu-Nong, Hung, Liang-Yi, Liu, Yao-Wen, Chen, Han-Ku, Hsiao, Yi-Ting, Wang, Wei-Sheng, Tsou, Jen-Hui,

Журнал:

Journal of Biological Chemistry

Рік:

2012

Мова:

english

Файл:

PDF, 5.96 MB

english, 2012

Effective Carbon Contaminant Cleaning Condition Using Ozone Dissolved Water and Megasonic for Ru-Capped Extreme Ultraviolet Lithography Mask

Lee, Seung-ho, Kang, Bong-kyun, Kim, Min-su, Ahn, Jin-ho, Cho, Han-ku, Lee, Han-shin, Park, Jin-Goo

Журнал:

Japanese Journal of Applied Physics

Рік:

2012

Мова:

english

Файл:

PDF, 148 KB

english, 2012

Which Mask is Preferred for Sub-60 nm Node Imaging?

Kim, Sung-Hyuck, Kim, Soon-Ho, Kim, Yong-Hoon, Lee, Jeung-Woo, Woo, Sang-Gyun, Cho, Han-Ku, Oh, Hye-Keun

Журнал:

Japanese Journal of Applied Physics

Рік:

2007

Мова:

english

Файл:

PDF, 543 KB

english, 2007

Quantitative Evaluation of Grid Size Effect on Critical Dimension Uniformity Improvement

Lee, Doo-Youl, Lee, Sung-Woo, Yeo, Gi-Sung, Lee, Jung-Hyeon, Cho, Han-Ku, Han, Woo-Sung

Журнал:

Japanese Journal of Applied Physics

Рік:

2004

Мова:

english

Файл:

PDF, 175 KB

english, 2004

Double-Patterning Technique Using Plasma Treatment of Photoresist

Lee, Doo-Youl, Kang, Yool, Chae, Yun-Sook, Lee, Suk-Joo, Cho, Han-Ku, Moon, Joo-Tae

Журнал:

Japanese Journal of Applied Physics

Рік:

2007

Мова:

english

Файл:

PDF, 373 KB

english, 2007

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, USA (Tuesday 11 September 2012)] Photomask Technology 2012 - Study for compensation of unexpected image placement error caused by VSB mask writer deflector

Lee, Hyun-joo, Abboud, Frank E., Faure, Thomas B., Choi, Min-kyu, Moon, Seong-yong, Cho, Han-Ku, Doh, Jonggul, Ahn, Jinho

Рік:

2012

Мова:

english

Файл:

PDF, 958 KB

english, 2012

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 19 September 2011)] Photomask Technology 2011 - The requirements for the future e-beam mask writer: statistical analysis of pattern accuracy

Lee, Sang Hee, Maurer, Wilhelm, Abboud, Frank E., Choi, Jin, Kim, Hee Bom, Kim, Byung Gook, Cho, Han-Ku

Рік:

2011

Мова:

english

Файл:

PDF, 730 KB

english, 2011

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Absorber stack optimization in EUVL masks: lithographic performances in alpha demo tool and other issues

La Fontaine, Bruno M., Seo, Hwan-Seok, Lee, Dong-Gun, Ahn, Byung-Sup, Koh, Cha-Won, Kang, In-Yong, Kim, Tae Geun, Kim, Hoon, Kim, Dongwan, Kim, Seong-Sue, Cho, Han-Ku

Рік:

2010

Мова:

english

Файл:

PDF, 1.57 MB

english, 2010

SPIE Proceedings [SPIE Photomask Technology 2002 - Monterey, CA (Tuesday 1 October 2002)] 22nd Annual BACUS Symposium on Photomask Technology - Validation of ArF Chromeless PSM in the Sub-100 nm Node DRAM Cell

Lee, Ju-Hyung, Chung, Dong-Hoon, Cha, Dong-Ho, Kim, Ho-Chul, Park, Joon-Soo, Nam, Dong-Seok, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung, Grenon, Brian J., Kimmel, Kurt R.

Рік:

2002

Мова:

english

Файл:

PDF, 989 KB

english, 2002

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Adaptability and validity of thin organic bottom anti-reflective coating (BARC) to sub-90-nm patterning in ArF lithography

Kim, Si-Hyun, Lee, Si-Hyeung, Yeo, Gi-Sung, Lee, Jeong Hyeong, Cho, Han-Ku, Han, Woo-Sung, Moon, Joo-Tae, Fedynyshyn, Theodore H.

Рік:

2003

Мова:

english

Файл:

PDF, 472 KB

english, 2003

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 10 September 2013)] Photomask Technology 2013 - Mask automation: need a revolution in mask makers and equipment industry

Moon, Seong-yong, Yu, Sang-yong, Noh, Young-hwa, Son, Ki-jung, Lee, Hyun-Joo, Cho, Han-Ku, Faure, Thomas B., Ackmann, Paul W.

Рік:

2013

Мова:

english

Файл:

PDF, 855 KB

english, 2013

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - Requirement of in-field illumination control for low k1 imaging below 0.3

Hwang, Chan, Smith, Bruce W., Shin, Jangho, Lee, Suk-Joo, Woo, Sang-Gyun, Cho, Han-Ku, Moon, Joo-Tae

Рік:

2005

Мова:

english

Файл:

PDF, 157 KB

english, 2005

SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - The study of CD error in mid-local pattern area caused by develop loading effect

Kang, Man-Kyu, Naber, Robert J., Kawahira, Hiroichi, Lee, Jung-Hun, Kim, Seong-Yoon, Kim, Byung-Gook, Woo, Sang-Gyun, Cho, Han-Ku

Рік:

2007

Мова:

english

Файл:

PDF, 272 KB

english, 2007

SPIE Proceedings [SPIE Photomask Technology 2002 - Monterey, CA (Tuesday 1 October 2002)] 22nd Annual BACUS Symposium on Photomask Technology - Comprehensive Approach to Determining the Specification for Mask Mean to Target

Lee, Sung-Woo, Kim, In-Sung, Lee, Jung-Hyun, Cho, Han-Ku, Han, Woo-Sung, Grenon, Brian J., Kimmel, Kurt R.

Рік:

2002

Мова:

english

Файл:

PDF, 571 KB

english, 2002

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - Overlay metrology for dark hard mask process: simulation and experiment study

Shin, Jangho, Archie, Chas N., Chalykh, Roman, Kang, Hyunjae, Kim, SeongSue, Lee, SukJoo, Cho, Han-Ku

Рік:

2007

Мова:

english

Файл:

PDF, 652 KB

english, 2007

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Most feasible curing process for ArF resists in device integration aspect

Kim, Hyun-Woo, Kang, Yool, Lee, Ju-Hyung, Chae, Yun-Sook, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung, Fedynyshyn, Theodore H.

Рік:

2003

Мова:

english

Файл:

PDF, 1.31 MB

english, 2003

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Improvement of pattern collapse in sub-100 nm nodes

Jung, Myoung-Ho, Lee, Sung-Ho, Kim, Hyun-Woo, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung, Fedynyshyn, Theodore H.

Рік:

2003

Мова:

english

Файл:

PDF, 83 KB

english, 2003

SPIE Proceedings [SPIE Photomask and Next-Generation Lithography Mask Technology XIV - Yokohama, Japan (Tuesday 17 April 2007)] Photomask and Next-Generation Lithography Mask Technology XIV - Requirements of nano-machining repair system for 45-nm node

Lee, Sang-Hyeon, Kim, Hwa-Sung, Shim, Hong-Seok, Lee, Su-Young, Kim, Geun-Bae, Kwon, Hyuk-Joo, Woo, Sang-Gyun, Cho, Han-Ku, Watanabe, Hidehiro

Рік:

2007

Мова:

english

Файл:

PDF, 483 KB

english, 2007

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Assessments on process parameters' influences to the proximity correction

Lee, Eun-Mi, Silver, Richard M., Lee, Sung-Woo, Lee, Doo-Youl, Choi, Soo-Han, Park, Joo-On, Jung, Sung-Gon, Yeo, Gi-Sung, Lee, Jung-Hyeon, Cho, Han-Ku, Han, Woo-Sung

Рік:

2004

Мова:

english

Файл:

PDF, 126 KB

english, 2004

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Characteristics and issues of an EUVL mask applying phase-shifting thinner absorber for device fabrication

Seo, Hwan-Seok, Schellenberg, Frank M., La Fontaine, Bruno M., Lee, Dong-Gun, Ahn, Byung-Sup, Han, Hakseung, Huh, Sungmin, Kang, In-Yong, Kim, Hoon, Kim, Dongwan, Kim, Seong-Sue, Cho, Han-Ku

Рік:

2009

Мова:

english

Файл:

PDF, 4.83 MB

english, 2009

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Successful application of angular scatterometry to process control in sub-100-nm DRAM device

Kim, Jin-ah, Silver, Richard M., Kim, Seong-Jin, Chin, Soo-Bok, Oh, Seok-Hwan, Goo, Doo-Hoon, Lee, Suk-Joo, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung, Moon, Joo-Tae, Raymond, Christopher J., Littau,

Рік:

2004

Мова:

english

Файл:

PDF, 487 KB

english, 2004

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Fulfillment of model-based OPC for contact patterns in 60-nm level logic device

Kim, Sang-Wook, Smith, Bruce W., Lee, Sung-Woo, Park, Chang-Min, Choi, Soo-Han, Lee, Young-Mi, Kang, Yool, Yeo, Gi-Sung, Lee, Jung-Hyeon, Cho, Han-Ku, Han, Woo-Sung

Рік:

2004

Мова:

english

Файл:

PDF, 815 KB

english, 2004

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Macro analysis of line edge and line width roughness

Shin, Jangho, Archie, Chas N., Yoon, Jinyoung, Jung, Youngjae, Lee, SukJoo, Woo, Sang-Gyun, Cho, Han-Ku, Moon, Joo-Tae

Рік:

2006

Мова:

english

Файл:

PDF, 372 KB

english, 2006

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - A method for generating assist-features in full-chip scale and its application to contact layers of sub-70nm DRAM devices

Park, Dong-Woon, Flagello, Donis G., Kim, Sangwook, Hwang, Chan, Lee, Sukjoo, Cho, Han-Ku, Moon, Joo-Tae

Рік:

2007

Мова:

english

Файл:

PDF, 284 KB

english, 2007

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Design for Manufacturability through Design-Process Integration II - Predicting conversion time of circuit design file by artificial neural networks

Jang, Sung-Hoon, Singh, Vivek K., Rieger, Michael L., Lee, Jee-Hyong, Ahn, Byoung-Sup, Ki, Won-Tai, Choi, Ji-Hyeon, Woo, Sang-Gyun, Cho, Han-Ku

Рік:

2008

Мова:

english

Файл:

PDF, 1003 KB

english, 2008

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Modified procedure for evaluation of low-k1 process windows

Park, Dong-Woon, Smith, Bruce W., Lee, Sook, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung

Рік:

2004

Мова:

english

Файл:

PDF, 191 KB

english, 2004

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Comparison of ArF bilayer resists for sub-90 nm L/S fabrication

Hong, Jin, Kim, Hyun-Woo, Lee, Sung-Ho, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung, Fedynyshyn, Theodore H.

Рік:

2003

Мова:

english

Файл:

PDF, 969 KB

english, 2003

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - The application criterion of model-based optical proximity correction in a low k1 process

Lee, Doo-Youl, Smith, Bruce W., Kim, In-Sung, Jung, Sung-Gon, Jung, Myoung-Ho, Park, Joo-On, Oh, Seok-Hwan, Woo, Sang-Gyun, Cho, Han-Ku, Moon, Joo-Tae

Рік:

2005

Мова:

english

Файл:

PDF, 961 KB

english, 2005

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Application of bi-layer resist on 70 nm node memory devices

Kang, Yool, Sturtevant, John L., Hong, Jin, Lee, Shi-Yong, Lee, Hyung-Rae, Ryoo, Man-Hyoung, Woo, Sang-Gyun, Cho, Han-Ku, Moon, Joo-Tae

Рік:

2005

Мова:

english

Файл:

PDF, 1.08 MB

english, 2005

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Optical Microlithography XIX - Mask topography effect on OPC at hyper-NA lithography

Lee, Sook, Flagello, Donis G., Kim, In-Sung, Chun, Yong-Jin, Kim, Sang-Wook, Lee, Suk-Joo, Woo, Sang-Gyun, Cho, Han-Ku, Moon, Joo-Tae

Рік:

2006

Мова:

english

Файл:

PDF, 506 KB

english, 2006

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Investigation on polarization monitoring mask: pattern design and experimental verification

Hwang, Chan, Archie, Chas N., Park, Dong-Woon, Shin, Jang-Ho, Nam, Dong-Seok, Lee, Suk-Joo, Woo, Sang-Gyun, Cho, Han-Ku, Moon, Joo-Tae

Рік:

2006

Мова:

english

Файл:

PDF, 171 KB

english, 2006

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Statistical analysis of CD-SEM measurement and process control in the indistinguishable multi-process patterns

Yang, Duck-Sun, Archie, Chas N., Jung, Myung-Ho, Lee, Young-Mi, Koh, Cha-Won, Yeo, Gi-Sung, Woo, Sang-Gyun, Cho, Han-Ku, Moon, Joo-Tae

Рік:

2006

Мова:

english

Файл:

PDF, 349 KB

english, 2006